Silicon nitride synthesis method and forming processing

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Silicon nitride You can obtain this chemical reaction at 1300-1400degC by directly mixing elemental silicon with nitrogen. Here is the chemical formula
3Si(s) + 2N2(g) -Si3N4(s)

This can be made with diimine.
SiCl4(l) + 6NH3(g) -Si(NH)2(s) + 4NH4Cl(s) (at 0 degC)
3Si(NH)2(s) -Si3N4(s) +N2(g) + 3H2(g) (at 1000 degC)

Alternativly, you can use carbothermal reaction to produce the product in nitrogen at 1400-1450degC
3SiO2(s) + 6 C(s) + 2N2(g) -Si3N4(s) + 6 CO(g)

With the discovery and development of silicon Nitride in the 1950s, the first synthetic method to nitride elemental silicon powder was created. The first way to mass produce silicon nitride powder is through this method. The silicon nitride that is produced from this raw material may contain iron and silicate if it has low purity.
Amorphous silicon nitride is produced by diamine decomposition. To make it crystallized, it must be further annealed at 1400-1500degC under nitrogen. The diamine-decomposition method has limited importance. It is currently second only to the commercial silicon nitride production process.
It is both the easiest method to make silicon nitride, and the most economically-friendly way to create silicon nitride in industry.
Electronic Grade silicon nitride Chemical vapor deposit or plasma-enhanced chemical vapour deposition are the methods used to make film.

3SiH4(g) + 4NH3(g) -Si3N4(s) + 12H2(g) 3SiCl4(g) + 4NH3(g) -Si3N4(s) + 12 HCl(g) 3SiCl2H2(g) + 4NH3(g) -Si3N4 (s) + 6 HCl(g) + 6H2(g)

Two methods are available to deposit silicon oxide on a semiconductor substrate.
1. Utilize low-pressure, chemical vapor deposition technology to create a high-temperature solution using a tube furnace.
2. It is possible to use plasma-enhanced vapor deposition technology under low temperatures.
It is different to elemental silicon in that the unit cell parameters for silicon nitride differ from those of silicon. The silicon nitride-generated film can create tension or stress depending on how it is dedeposited. You can reduce the tension by changing the parameters of the plasma-enhanced vapor deposition technique.
First silica preparation is done by sol-gel. Next, the silica gel that contains ultra-fine particles of carbon is subject to the carbothermal reduced method. Finally, silicon nitride Nanowires are obtained by nitridation. At 1200-1350°C, the silica gel’s ultra-fine carbon parts are formed by decomposition glucose. There may be several reactions that are involved in the synthesis.

Si3CO(g), -Si3CO(s), -Si3N4 -Si3N4

The method of processing the silicon nitride blob
Silicon nitride Because it’s a granular substance, processing is hard. The melting point for silicon nitride at 1850 degrees Celsius cannot be exceeded. This is because it will begin to decompose and become silicon and nitrogen. Hot press sintering is no longer acceptable. It is possible to bond silicon nitride particles together using binders or other substances. The liquid phase of silicon nitride will undergo some cooling and then become a solid material. The process will result in impurities because it requires the use of binding agents or sintering tools. Another method to produce purer bulk material is spark plasma sintering. In a few seconds, the powder compacted is pulsed. You can use this technique at temperatures between 1500 to 1700C. You will get dense, compact silicon nitride pieces at this temperature.

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