Titanium Silicate-the Most Ideal Conductive Film Today

What exactly is Titanium Silicide Due to the shrinkage of device sizes, metal silicides, also known as metal electrodes, are used extensively in source drain/gate of metal oxide silicon field effect transistors. (M0SFET). TiSi2 is a titanium silicide. This (TiSi2 ), has the benefits of high resistance, low temperature resistance, good stability, and great versatility.

Preparation for Titanium Silicate

High temperature stability and a quick forming process are two of the benefits that titanium silicate offers. Two methods can generally be used to make titanium silicate. Two methods can produce titanium silicate.

Uses of Titanium Silicate

As mentioned above, titanium silicate has excellent properties: high electrical conductivity, high selectivity, good thermal stability, good absorption to Si, good process adaptability and low interference to silicon connection parameters.Therefore, titanium silicate is widely used in gate, source/drain, interconnection and ohmic contact manufacturing of metal oxide semiconductor (MOS), metal oxide semiconductor field effect transistor (MOSFET) and dynamic random access memory (DRAM) in integrated circuit devices.

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