Tungsten Silicide

tungsten silicide is a low-bulk resistance, low-stress material used in a variety of applications. It has the ability to withstand temperatures up to 1000°C, and is useful in SOI (silicon on insulator) fabrication as a ground plane and buried conduction layer.

WSi2 is an effective anti-oxidation coating for electronic components and has high thermal stability. It is often used in a wide range of electronics, including RF power amplifiers, microwave circuitry and CMOS integrated circuits.

The tungsten disilicide WSi2 powder is produced at a high purity and is offered in various shapes, such as tablets, granules, rods, and wires. It is a versatile material that can be applied in a number of deposition processes, such as semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition.

We supply the tungsten silicide WSi2 powder at reasonable prices in vacuum packing, 1kg/bag and 25kg/barrel. Please contact us if you need more information about this product or other materials.

tungsten silicide is a good choice for use in MOS/CMOS process because it has the potential to reduce gate sheet resistance. This is particularly important in trench power MOSFETs where metallization of the gate electrodes helps reduce distributed RC propagation delay and enhances device reliability.

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