High Purity Cobalt Silicide CoSi2 Powder CAS 12017-12-8, 99% |

Cobalt Silicide CoSi2 Poudre :
Cobalt Silicide This is an intermetallic cobalt silicate compound. Superconductor, with Ca transition temperature. Cobalt disilicide Chemical Formula CoSi2 It can be oxidized at 1200 to erode its surface. It can oxidize at 1200 deg C to erode its surfaces; reacts with fluorine and chlorine at low temperature, and at 300 deg C with concentrated nitric and sulfuric acids. Molten strong alkali can also attack it violently. It is a slow reaction with boiling concentrated hydrochloric.
CoSi2 powder Has low resistivity and excellent thermal stability. Widely used as a large-scale integrated contact. And CoSi2 CoSi2/Si can be formed on Si substrates, and is used for studying the interface characteristics of epitaxial Silicon Metal.

Send an inquiry for the latest news Prices of cobalt disilicide You can buy if you want to Cobalt Silicide CoSi2 Powder Bulk discounts are available.

Cobalt Silicide CoSi2:
Cobalt Silicide CoSi2 Powder (CAS 12017-12-8), has a high melting temperature, high corrosion resistance and high oxidation resistant, as well as good electrical conductivity.

Technical Parameters of Cobalt Silicide CoSi2:

Product Name	MF	Purity	Particle Size	Melting Point	Density	Color
cobalt silicide	CoSi2	99%	5-10um	1277	5.3 g/cm3	Black

What is Cobalt Silicide CoSi2 Powder produced?
Cobalt disilicide can be produced by forming a metal cobalt layer (CO) on a siliceous substrate, and then converting it to Cobalt Disilicide after two annealing treatment. The first annealing procedure involves diffusion of shillings cobalt onto a silicon substrate in order to form COSi. The second annealing step is to convert a layer of cobalt silicate into Cobalt diilicide (with a low resistivity) to reduce resistance.

Cobalt silicide CoSi2 Powder :
Cobalt Silicide CoSi2 is used to make lasers, semiconductors and other devices.
Silicide nanostructures are useful in many fields of nanoelectronics. Semiconductor silicides such as FeSi2 can be used for nanowires to be used in quantum computers, and fault-tolerant nanocircuits. Due to the lack of grain boundaries, epitaxial metal silicides have a much better performance than ordinary metal nanowires. Cobalt diilicide (CoSi2) is formed on internal electrical connections, such as drain, source or gate, in the manufacturing of semiconductor components.

Packing & Shipping of Cobalt Silicide CoSi2:
The quantity of Cobalt Silicide CoSi2 powder will determine the type of packaging we use.
Cobalt Silicide CoSi2 Powder Packing As per your request, vacuum packaging is available in 1kg/bags, 25kg/barrels, or both.
Cobalt silicide powder CoSi2 shipping Payment receipt can be used to ship out the goods by air, sea, or express as soon possible.


Technology Co. Ltd., () is an established global chemical material manufacturer and supplier with over 12 years’ experience in the production of high-quality nanomaterials. These include boride powders, nitride particles, graphite particles, sulfide particles, 3D printing materials, etc.
Looking for high quality CoSi2 Powder Contact us by sending an email. (brad@ihpa.net)