Metal Alloy High Purity Titanium Sputtering Target |

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Titanium sputtering targets are widely used in coatings for flat display panels, semiconductor components and hardware tool coatings. It is also a core material for the preparation of integrated circuits.

High Purity Metal Alloy Titanium Sputtering targets:
ASTM B265, ASME SB265, ASTM F67, ASTM F136, AMS 4902, AMS 4911

Titanium metal is used to make sputtering targets. It is known for having a high strength-toweight ratio. It is a low-density metal that is very ductile, lustrous and metallic-white. The high melting point of the metal (more 1,650 degC/3,000 degF), makes it a good refractory. It is also paramagnetic, and it has a relatively low electrical and thermal resistance.

Used primarily for flat panel display, integrated circuit and DRAMS applications.

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High Purity Titanium Metal Sputtering Target

Alternative Names Titanium Sputtering Target
CAS Number N/A
Compound Formula It is a good idea to use a different language.
Molecular Mass N/A
Appearance N/A
Melting Point N/A
Solubility N/A
Density N/A
Purity 99.6%
Size The following are examples of customized products:
Bold point N/A
Specific Heating N/A
Thermal Conduction N/A
Thermal Expander N/A
Young’s Module N/A
Exact Mass N/A
Monoisotopic Mash N/A

Health & Safety Information on Metal Alloy Titanium Sputtering target

Safety Advisory N/A
Hazard Statements N/A
Flashing point N/A
Hazard Codes N/A
Risk Codes N/A
Safety Declarations N/A
RTECS Number N/A
Transport Information N/A
WGK Germany N/A
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