High Purity Metal Alloy Titanium Sputtering targets:
Standard:
ASTM B265, ASME SB265, ASTM F67, ASTM F136, AMS 4902, AMS 4911
Properties:
Titanium metal is used to make sputtering targets. It is known for having a high strength-toweight ratio. It is a low-density metal that is very ductile, lustrous and metallic-white. The high melting point of the metal (more 1,650 degC/3,000 degF), makes it a good refractory. It is also paramagnetic, and it has a relatively low electrical and thermal resistance.
Application:
Used primarily for flat panel display, integrated circuit and DRAMS applications.
Payment & Transport:
High Purity Titanium Metal Sputtering Target |
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| Alternative Names | Titanium Sputtering Target |
| CAS Number | N/A |
| Compound Formula | It is a good idea to use a different language. |
| Molecular Mass | N/A |
| Appearance | N/A |
| Melting Point | N/A |
| Solubility | N/A |
| Density | N/A |
| Purity | 99.6% |
| Size | The following are examples of customized products: |
| Bold point | N/A |
| Specific Heating | N/A |
| Thermal Conduction | N/A |
| Thermal Expander | N/A |
| Young’s Module | N/A |
| Exact Mass | N/A |
| Monoisotopic Mash | N/A |
Health & Safety Information on Metal Alloy Titanium Sputtering target |
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| Safety Advisory | N/A |
| Hazard Statements | N/A |
| Flashing point | N/A |
| Hazard Codes | N/A |
| Risk Codes | N/A |
| Safety Declarations | N/A |
| RTECS Number | N/A |
| Transport Information | N/A |
| WGK Germany | N/A |