Particle Size : 5-10um
Titanium Silicide (TiSi2) Powder
As large integrated circuits (ULSI) develop rapidly, equipment sizes and requirements are increasing.
As the wire diameter of the semiconductor device is currently less than 0.1mm, it’s impossible to get a continuous conductor that has a low resistivity during the original manufacturing process.
For circuit metallization, it is essential to find new materials, processes, and deposition systems that can replace aluminum or polysilicon heavy-doped.
These new materials are gaining popularity, especially metal silicon, which is compatible with current microelectronics production processes. Titanium Disilicide It has a low resistance, high temperature, and good stability.
It is a common practice to study metal silicide (such as TiSi2 Nisi, Cosi2, WASi2, TaSi2, and MOSi2)) silicides have the following ideal properties: high conductivity (TiSi2), high selectivity (WSi2), good thermal stability (TiSi2), good Adsorption of Si, and good process adaptability for silicon-adaptive connection parameters. Hence, the integrated device has a high-performance silicon adaptable connection parameter. Titanium silicide TiSi2 Source/leakage ohm, mutual contact ohm, and DRAM (dynamic random access memory) are all commonly used in the production of a metal-oxide semiconductor (MOS).
Send an inquiry for the latest news titanium disilicide price You can buy if you want to Titanium Silicide TiSi2 powder Bulk discounts are available.
Titanium Silicide powder TiSi2 – Characteristics
The TiSi2 titanium silicide (CAS 1239-83-7), has a melting point of 1700°C, is highly corrosion resistant, and exhibits high oxidation resistance. It also offers good electrical conductivity at high temperatures, as well a binary system.
Technical Parameter of Titanium Silicate TiSi2 powder:
Chemical Composition of Titanium Silicate TiSi2 powder:
How does molybdenum sulicide work? MoSi2 Powder made?
When titanium or silicon hydride react, di silicide is produced.
Ti + Si = Tisi2
Aluminum heat can also be performed by the ignition of aluminum powder, sulfur, silica and titanium dioxide or hexafluoritititoetice, by electrolysis of hexafluoride titanate and titanium dioxide, or through tetrachloride reaction.
One method is to react titanium tetrachloride into silanes, dichloronilanes or silicon.
TiCl4 = 2 SiH4 + Tisi2 – 4 HCl + H2
TiCl4 + SiH2Cl2+ 2 H2 – Tisi2+ 8 HCL
TiCl4 + 3 – Tisi2 SiCL4
Applications Molybdenum Silicide MoSi2 Powder:
Titanium silicides are used in the semiconductor sector. It is commonly grown by using the salicide technique over silicon and Polysilicon lines in order to reduce sheet resistance at local transistor connections. In the microelectronics industry, it’s typically used at the C54 phase.
1. Silicide titaniumide has low melting points, stable chemical properties and is widely used in the field of microelectronics.
2. Aerospace, ship, submarine, medical and jewelery manufacturing.
Packing & Shipping Titanium Silicide powder TiSi2 –
The packing we use depends on how much titanium silicide (TiSi2) powder is used.
Titanium silicide (TiSi2) powder: Vacuum packaging 100g,500g or 1kg/bag. 25kg/barrel.
Titanium silicide powder TiSi2 shipping Once payment has been received, goods can be shipped by air or sea as soon as possible.
Technology Co. Ltd., () is an established global chemical material manufacturer and supplier with over 12 years’ experience in the production of high-quality nanomaterials. These include boride powders, nitride particles, graphite particles, sulfide particles, 3D-printing powders, etc.
Looking for high quality TiSi2 powder Contact us by sending an email. (brad@ihpa.net)
As large integrated circuits (ULSI) develop rapidly, equipment sizes and requirements are increasing.
As the wire diameter of the semiconductor device is currently less than 0.1mm, it’s impossible to get a continuous conductor that has a low resistivity during the original manufacturing process.
For circuit metallization, it is essential to find new materials, processes, and deposition systems that can replace aluminum or polysilicon heavy-doped.
These new materials are gaining popularity, especially metal silicon, which is compatible with current microelectronics production processes. Titanium Disilicide It has a low resistance, high temperature, and good stability.
It is a common practice to study metal silicide (such as TiSi2 Nisi, Cosi2, WASi2, TaSi2, and MOSi2)) silicides have the following ideal properties: high conductivity (TiSi2), high selectivity (WSi2), good thermal stability (TiSi2), good Adsorption of Si, and good process adaptability for silicon-adaptive connection parameters. Hence, the integrated device has a high-performance silicon adaptable connection parameter. Titanium silicide TiSi2 Source/leakage ohm, mutual contact ohm, and DRAM (dynamic random access memory) are all commonly used in the production of a metal-oxide semiconductor (MOS).
Send an inquiry for the latest news titanium disilicide price You can buy if you want to Titanium Silicide TiSi2 powder Bulk discounts are available.
Titanium Silicide powder TiSi2 – Characteristics
The TiSi2 titanium silicide (CAS 1239-83-7), has a melting point of 1700°C, is highly corrosion resistant, and exhibits high oxidation resistance. It also offers good electrical conductivity at high temperatures, as well a binary system.
Technical Parameter of Titanium Silicate TiSi2 powder:
Product Name | MF | Purity | Particle Size | Melting Point | Density | Color |
Titan Silicide | TiSi2 | 99% | 5-10um | 1620 | 4.0 g/cm3 | Black |
Chemical Composition of Titanium Silicate TiSi2 powder:
TiSi2 | It is a good idea to use a different language. | Si | C | You can also find out more about P | Fe | S |
>99% | 46.32% | 52.5% | 0.02% | 0.02% | 0.19% | 0.01% |
How does molybdenum sulicide work? MoSi2 Powder made?
When titanium or silicon hydride react, di silicide is produced.
Ti + Si = Tisi2
Aluminum heat can also be performed by the ignition of aluminum powder, sulfur, silica and titanium dioxide or hexafluoritititoetice, by electrolysis of hexafluoride titanate and titanium dioxide, or through tetrachloride reaction.
One method is to react titanium tetrachloride into silanes, dichloronilanes or silicon.
TiCl4 = 2 SiH4 + Tisi2 – 4 HCl + H2
TiCl4 + SiH2Cl2+ 2 H2 – Tisi2+ 8 HCL
TiCl4 + 3 – Tisi2 SiCL4
Applications Molybdenum Silicide MoSi2 Powder:
Titanium silicides are used in the semiconductor sector. It is commonly grown by using the salicide technique over silicon and Polysilicon lines in order to reduce sheet resistance at local transistor connections. In the microelectronics industry, it’s typically used at the C54 phase.
1. Silicide titaniumide has low melting points, stable chemical properties and is widely used in the field of microelectronics.
2. Aerospace, ship, submarine, medical and jewelery manufacturing.
Packing & Shipping Titanium Silicide powder TiSi2 –
The packing we use depends on how much titanium silicide (TiSi2) powder is used.
Titanium silicide (TiSi2) powder: Vacuum packaging 100g,500g or 1kg/bag. 25kg/barrel.
Titanium silicide powder TiSi2 shipping Once payment has been received, goods can be shipped by air or sea as soon as possible.
Technology Co. Ltd., () is an established global chemical material manufacturer and supplier with over 12 years’ experience in the production of high-quality nanomaterials. These include boride powders, nitride particles, graphite particles, sulfide particles, 3D-printing powders, etc.
Looking for high quality TiSi2 powder Contact us by sending an email. (brad@ihpa.net)
Titanium Silicide Properties |
|
Alternative Names | TiSi2 powder is titanium disilicide |
CAS Number | 12039-83-7 |
Compound Formula | TiSi2 |
Molecular Mass | 104.04 |
Appearance | Black Powder |
Melting Point | 1470 degC |
Boiling Point | N/A |
Density | 4.02 g/cm3 |
Solubility In H2O | N/A |
Exact Mass | 103.9018 |
Titanium Boride Safety & Security Information |
|
Sign Word | N/A |
Hazard Statements | N/A |
Hazard Codes | N/A |
Risk Codes | N/A |
Safety Declarations | N/A |
RTECS Number | N/A |
Transport Information | N/A |
WGK Germany | N/A |